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Zhangnan Zhu
at ASML
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Publications (1)
Proceedings Article | 25 September 2010 Paper
A full chip MB-SRAF placement using the SRAF guidance map
Min-Chun Tsai, Shigeki Nojima, Masahiro Miyairi, Tatsuo Nishibe, Been-Der Chen, Hanying Feng, William Wong, Zhangnan Zhu, Yen-Wen Lu
Proceedings Volume 7823, 78233Q (2010) https://doi.org/10.1117/12.866139
KEYWORDS: SRAF, Optical proximity correction, Photomasks, Model-based design, Lithography, Mask making, Solids, Control systems, Logic, Statistical modeling
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