Dr. Zhuan Liu Profile

Dr. Zhuan Liu

Senior Scientist at Onto Innovation Inc

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Author

Publications (18)

Proceedings Article | 10 April 2024 Poster + Paper

Using deep learning ADC for defect classification for automatic defect inspection

Bryce Chi, Andy Chen, Jay Chen, Terry Voots, Maruko Wu, Cheolkyu Kim, Zhuan Liu

Proceedings Volume 12955, 129551X (2024) https://doi.org/10.1117/12.3000815

KEYWORDS: Analog to digital converters, Deep learning, Machine learning, Education and training, Image classification, Evolutionary algorithms, Performance modeling, Matrices, Library classification systems, Image processing

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Proceedings Article | 26 May 2022 Presentation + Paper

Novel inline on-device measurement of silicon nitride lateral recess post channel hole ACI with IRCD metrology

Nick Keller, Wenmei Ming, Zhuo Chen, G. Andrew Antonelli, Troy Ribaudo, Zhuan Liu, Sadao Takabayashi, John Hauck, Joshua Frederick, Dan Engelhard

Proceedings Volume 12053, 120530T (2022) https://doi.org/10.1117/12.2618035

KEYWORDS: Silicon, Etching, Metrology, Semiconducting wafers, Mid-IR, Diffractive optical elements, Silica, Scattering, Critical dimension metrology, Absorption

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Proceedings Article | 22 February 2021 Presentation + Paper

Ellipsometric critical dimension metrology employing mid-infrared wavelengths for high-aspect-ratio channel hole module etch processes

G. Andrew Antonelli, Nick Keller, Troy Ribaudo, Franklin Wong, Wenmei Ming, Hepeng Ding, Zhuo Chen, Ross Grynko, Ahmad Fumani, Zhuan Liu, Sadao Takabayashi, John Hauck, Joshua Frederick, Dan Engelhard, Bo Hui Ng, Biow Hiem Ong, Luey Chwan Liong

Proceedings Volume 11611, 116111O (2021) https://doi.org/10.1117/12.2583786

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SPIE Journal Paper | 16 October 2014

Scatterometry performance enhancement by holistic approach

Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsehpour, Holger Schroder, John Piggot

JM3, Vol. 13, Issue 04, 041406, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041406

KEYWORDS: Critical dimension metrology, Scatterometry, Line edge roughness, Reactive ion etching, Metrology, Scatter measurement, Semiconducting wafers, Optics manufacturing, Magnetism, Etching

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Proceedings Article | 2 April 2014 Paper

Scatterometry performance improvement by parameter and spectrum feed-forward

Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsepour

Proceedings Volume 9050, 90502T (2014) https://doi.org/10.1117/12.2046639

KEYWORDS: Reactive ion etching, Scatterometry, Critical dimension metrology, Metrology, Magnetism, Manufacturing, Photomasks, Etching, Measurement devices, Semiconducting wafers

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Proceedings Article | 2 April 2014 Paper

Enhanced optical CD metrology by hybridization and azimuthal scatterometry

Shahin Zangooie, Jie Li, Karthik Boinapally, Peter Wilkens, Avraham Ver, Babak Khamsepour, Holger Schroder, John Piggot, Sanjay Yedur, Zhuan Liu, Jiangtao Hu

Proceedings Volume 9050, 90501G (2014) https://doi.org/10.1117/12.2046165

KEYWORDS: Scatterometry, Critical dimension metrology, Line edge roughness, Scatter measurement, Semiconducting wafers, Metrology, Reactive ion etching, Manufacturing, Ellipsometry, Data modeling

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Proceedings Article | 10 April 2013 Paper

Scatterometry evaluation of focus-dose effects of EUV structures

Prasad Dasari, Oleg Kritsun, Jie Li, Catherine Volkman, Jiangtao Hu, Zhuan Liu

Proceedings Volume 8681, 86810T (2013) https://doi.org/10.1117/12.2012120

KEYWORDS: Critical dimension metrology, Scatterometry, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Metrology, Scanners, 3D modeling, Scanning electron microscopy, Ellipsometry

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Proceedings Article | 5 April 2012 Paper

Scatterometry metrology challenges of EUV

Prasad Dasari, Jie Li, Jiangtao Hu, Zhuan Liu, Oleg Kritsun, Catherine Volkman

Proceedings Volume 8324, 83240M (2012) https://doi.org/10.1117/12.916006

KEYWORDS: Scatterometry, Extreme ultraviolet lithography, Critical dimension metrology, Extreme ultraviolet, Metrology, Semiconducting wafers, Double patterning technology, Cadmium, Optical lithography, Ellipsometry

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Proceedings Article | 20 April 2011 Paper

Metrology characterization of spacer double patterning by scatterometry

Prasad Dasari, Jie Li, Jiangtao Hu, Zhuan Liu, Oleg Kritsun, Catherine Volkman

Proceedings Volume 7971, 797111 (2011) https://doi.org/10.1117/12.879900

KEYWORDS: Scatterometry, Critical dimension metrology, Semiconducting wafers, Metrology, Double patterning technology, Etching, Process control, Scatter measurement, Reflectometry, Scanning electron microscopy

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SPIE Journal Paper | 1 October 2010

Scatterometry characterization of spacer double patterning structures

Prasad Dasari, Jiangtao Hu, Zhuan Liu, Asher Tan, Oleg Kritsun, Catherine Volkman, Christopher Bencher

JM3, Vol. 9, Issue 04, 041309, (October 2010) https://doi.org/10.1117/12.10.1117/1.3531999

KEYWORDS: Scatterometry, Critical dimension metrology, Double patterning technology, Semiconducting wafers, Etching, Reflectance spectroscopy, Metrology, Spectroscopy, Reflectometry, Lithography

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SPIE Journal Paper | 1 October 2010

Mueller matrix measurement of asymmetric gratings

Jie Li, Justin Hwu, Yongdong Liu, Silvio Rabello, Zhuan Liu, Jiangtao Hu

JM3, Vol. 9, Issue 04, 041305, (October 2010) https://doi.org/10.1117/12.10.1117/1.3514708

KEYWORDS: Picosecond phenomena, Scatterometry, Atomic force microscopy, Nanoimprint lithography, Calibration, Spectroscopic ellipsometry, Scanning electron microscopy, Photoresist processing, Metrology, Polarization

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Proceedings Article | 2 April 2010 Paper

Scatterometry characterization of spacer double patterning structures

Prasad Dasari, Jiangtao Hu, Zhuan Liu, Asher Tan, Oleg Kritsun, Catherine Volkman, Chris Bencher

Proceedings Volume 7638, 76381J (2010) https://doi.org/10.1117/12.848518

KEYWORDS: Scatterometry, Critical dimension metrology, Double patterning technology, Semiconducting wafers, Etching, Metrology, Overlay metrology, Scatter measurement, Spectroscopy, Ellipsometry

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Proceedings Article | 2 April 2010 Paper

A comparison of advanced overlay technologies

Prasad Dasari, Nigel Smith, Gary Goelzer, Zhuan Liu, Jie Li, Asher Tan, Chin Hwee Koh

Proceedings Volume 7638, 76381P (2010) https://doi.org/10.1117/12.848189

KEYWORDS: Overlay metrology, Semiconducting wafers, Scatterometry, Error analysis, Data modeling, Reflectometry, Process control, Spectroscopy, Diffraction gratings, Carbon

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Proceedings Article | 11 December 2009 Paper

Scatterometry measurement of asymmetric gratings

Jie Li, Justin Hwu, Yongdong Liu, Silvio Rabello, Zhuan Liu, Jiangtao Hu

Proceedings Volume 7520, 75201B (2009) https://doi.org/10.1117/12.839821

KEYWORDS: Picosecond phenomena, Scatterometry, Atomic force microscopy, Lithography, Scatter measurement, Critical dimension metrology, Spectroscopic ellipsometry, Photoresist processing, Calibration, Metrology

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Proceedings Article | 24 March 2009 Paper

Uncertainty and sensitivity analysis and its applications in OCD measurements

Pedro Vagos, Jiangtao Hu, Zhuan Liu, Silvio Rabello

Proceedings Volume 7272, 72721N (2009) https://doi.org/10.1117/12.814363

KEYWORDS: Silicon, Metrology, 3D modeling, Data modeling, Optimization (mathematics), 3D metrology, Silica, Reflectometry, Mathematical modeling, Neodymium

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Proceedings Article | 23 March 2009 Paper

Simultaneous overlay and CD measurement for double patterning: scatterometry and RCWA approach

Jie Li, Zhuan Liu, Silvio Rabello, Prasad Dasari, Oleg Kritsun, Catherine Volkman, Jungchul Park, Lovejeet Singh

Proceedings Volume 7272, 727207 (2009) https://doi.org/10.1117/12.814706

KEYWORDS: Overlay metrology, Critical dimension metrology, Semiconducting wafers, Scatterometry, Double patterning technology, Error analysis, Reflectivity, Metrology, Cadmium, Diffraction gratings

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Proceedings Article | 10 May 2005 Paper

Measurement of deep silicon trench profile using normal incidence optical CD metrology

Zhuan Liu, Xiaodong Zhang, Jiangtao Hu, D. Roy

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600121

KEYWORDS: Semiconducting wafers, Silicon, Critical dimension metrology, Scanning electron microscopy, Atomic force microscopy, Process control, Time metrology, Reflectivity, Metrology, Etching

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Proceedings Article | 24 May 2004 Paper

OCD study of critical dimension and line-shape control of shallow-trench-isolation structures

Ye Feng, Xiaodong Zhang, Beverly Cheung, Zhuan Liu, Mita Isao, Manabu Hayashi

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536582

KEYWORDS: Semiconducting wafers, Silicon, Critical dimension metrology, Photoresist materials, Finite element methods, Dysprosium, Process control, Etching, Semiconductors, Wafer-level optics

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Showing 5 of 18 publications

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