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PROCEEDINGS VOLUME PC12915
PHOTOMASK JAPAN 2023 | 25-27 APRIL 2023
Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology
Editor(s): Yosuke Kojima
Editor Affiliations +
IN THIS VOLUME
11 Sessions, 0 Papers, 20 Presentations
Opening Session: Day 1  (3)
EUV Inspection and Repair  (2)
NIL I  (1)
NIL II  (2)
EUV Lithography and Source  (2)
Opening Session: Day 2  (1)
Mask Data Handling  (1)
EUV Technologies  (3)
Opening Session: Day 3  (2)
AI Utilization  (1)
Writing Tools  (2)
Proceedings Volume PC12915 is from: Logo
PHOTOMASK JAPAN 2023
25-27 April 2023
Online Only, Japan
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Opening Session: Day 1
Statuses and challenges of high NA EUV eco-system Presentation
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1291501 https://doi.org/10.1117/12.3012427
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Applications of EUV metrology tools Presentation
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1291502 https://doi.org/10.1117/12.3012429
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Using x-ray fluorescence as an independent metrology of layer thickness and intermixing in reflective EUV multilayers Presentation
Ashish Kulkarni
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1291503 https://doi.org/10.1117/12.3012430
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EUV Inspection and Repair
Progress report on actinic patterned mask inspection for EUVL Presentation
Safak Sayan
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1291504 https://doi.org/10.1117/12.3012431
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In-line scanning probe technologies for mask defect inspection and repair Presentation
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1291505 https://doi.org/10.1117/12.3012432
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NIL I
TELs patterning technologies for next generation lithography: using nanoimprint lithography Presentation
Tomohiro Yamaji
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1291506 https://doi.org/10.1117/12.3012433
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NIL II
Nanoimprint: from single DIE to wafer-level Presentation
Christine Thanner
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1291507 https://doi.org/10.1117/12.3012434
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This conference presentation was prepared for Photomask Japan 2023. Presentation
Hiromasa Niinomi
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1291508 https://doi.org/10.1117/12.3012435
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EUV Lithography and Source
High NA EUV: progress update and mask impact Presentation
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1291509 https://doi.org/10.1117/12.3012436
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Modeling of the emission spectrum from Sn to rare-earth elements for the extreme ultra-violet lithography Presentation
Akira Sasaki
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC129150A https://doi.org/10.1117/12.3012437
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Opening Session: Day 2
Holistic approaches toward high NA EUV lithography Presentation
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC129150B https://doi.org/10.1117/12.3012438
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Mask Data Handling
You don't need 1nm contours for curvilinear shapes: pixel-based computing is the answer Presentation
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC129150C https://doi.org/10.1117/12.3012439
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EUV Technologies
Spatial frequency breakdown of CD variation Presentation
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC129150D https://doi.org/10.1117/12.3012441
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ZEISS AIMS EUV high NA for actinic mask review with EXE:5000 scanner emulation Presentation
K. Gwosch
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC129150E https://doi.org/10.1117/12.3012443
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Imaging performance of low-n absorbers at the optical resolution limits of high NA EUV systems Presentation
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC129150F https://doi.org/10.1117/12.3012444
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Opening Session: Day 3
New reticle-like sensors deliver fast, easy measurements inside the process chamber Presentation
Yukinobu Hayashi
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC129150G https://doi.org/10.1117/12.3012445
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Investigation of mask impact on wafer LCDU in ArF lithography Presentation
Itaru Yoshida
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC129150H https://doi.org/10.1117/12.3012446
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AI Utilization
Applying deep learning methods in flat panel display mask shop operation Presentation
Stefan Fu
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC129150I https://doi.org/10.1117/12.3012447
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Writing Tools
Current performance of electron multi-beam mask writers and future plans toward high-NA EUV era Presentation
Jumpei Yasuda
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC129150J https://doi.org/10.1117/12.3012448
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DUV Mask Writer addressable to 90nm nodes with a sustainability profile Presentation
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC129150K https://doi.org/10.1117/12.3012449
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