Nanofabrication of high-Q thin film lithium niobate microrings using wet etching

Rongjin Zhuang; Jinze He; Haifeng Hu; Yifan Qi; Lihua Xu; Weiguo Chu; Yang Li

doi:10.1117/12.3000688

12 March 2024 Nanofabrication of high-Q thin film lithium niobate microrings using wet etching

Rongjin Zhuang, Jinze He, Haifeng Hu, Yifan Qi, Lihua Xu, Weiguo Chu, Yang Li

Author Affiliations +

Proceedings Volume PC12882, Optical Components and Materials XXI; PC1288209 (2024) https://doi.org/10.1117/12.3000688
Event: SPIE OPTO, 2024, San Francisco, California, United States

Abstract

As an excellent material platform for integrated photonics, thin film lithium niobate (TFLN) boots the performance of various integrated photonic devices such as integrated electro-optic modulators, integrated optical frequency combs, and nonlinear wavelength converters. The performance of these devices is highly dependent on the quality of nanofabrication method. Despite the fact that conventional inductively coupled plasma–reactive ion etching can achieve TFLN microrings with intrinsic quality factor (Q-factor) as high as 10 million, this method still shows high cost, poor reproducibility, and low throughput. Here, we achieved z-cut TFLN micro-racetrack with an intrinsic Q-factor over 11.9 million using we etching method. This method can facilitate the mass production of high-performance integrated TFLN devices with low cost, high reproducibility, and high throughput.

Conference Presentation

Citation Download Citation

Rongjin Zhuang, Jinze He, Haifeng Hu, Yifan Qi, Lihua Xu, Weiguo Chu, and Yang Li "Nanofabrication of high-Q thin film lithium niobate microrings using wet etching", Proc. SPIE PC12882, Optical Components and Materials XXI, PC1288209 (12 March 2024); https://doi.org/10.1117/12.3000688

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