Optical Measuring Technology Of The Micropatterns

S. Yoshida; K. Nakazawa; A. Tanimoto

doi:10.1117/12.957187

17 July 1979 Optical Measuring Technology Of The Micropatterns

S. Yoshida, K. Nakazawa, A. Tanimoto

Proceedings Volume 0174, Developments in Semiconductor Microlithography IV; (1979) https://doi.org/10.1117/12.957187
Event: Developments in Semiconductor Microlithography IV, 1979, San Jose, United States

Abstract

This paper describes three optical measuring machines which have been recently developed for state-of-the-art microlithography, as follows: (1) X-Y measuring machine for checking photomask registration. Utilizing a photoelectric microscope and a laser interferometer, this machine has a repeatability of less than O.lμm, covering a measuring range of 6 inches. (2) Measuring machine for critical line width (1 - 100µm) of photomask. This machine likewise utilizes the latest photoelectric detection technology; it has a repeatability of approximately 0.05µm. (3) Measuring machine for wafer and photomask micropatterns. A newly developed system which makes use of laser beam technology is incorporated in this machine; measurement repeatability is approximately 0.05µm.

Citation Download Citation

S. Yoshida, K. Nakazawa, and A. Tanimoto "Optical Measuring Technology Of The Micropatterns", Proc. SPIE 0174, Developments in Semiconductor Microlithography IV, (17 July 1979); https://doi.org/10.1117/12.957187

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