Step And Repeat Wafer Imaging

S. Wittekoek

doi:10.1117/12.958617

5 September 1980 Step And Repeat Wafer Imaging

S. Wittekoek

Proceedings Volume 0221, Developments in Semiconductor Microlithography V; (1980) https://doi.org/10.1117/12.958617
Event: Semiconductor Microlithography V, 1980, San Jose, United States

Abstract

Recent advances in the development of wafer steppers at Philips Research Labs. ("sili-con repeaters") are described. A high resolution, high-throughput, completely automatic step and repeat wafer imaging systems for VLSI production has been constructed. Emphasis in this paper is on automatic alignment and high resolution imaging. The automatic alignment system is based on relief gratings, and has an accuracy better than ± 0.1 micron. Alignment time is short and the system is compatible with production requirements, such as automatic wafer feeding. The imaging system is a diffraction limited 5x reduction lens with a numerical aperture of 0.3 and a field of 14 mm diameter, corrected for two wavelengths. Resolu-tion and alignment results on silicon wafers are given.

Citation Download Citation

S. Wittekoek "Step And Repeat Wafer Imaging", Proc. SPIE 0221, Developments in Semiconductor Microlithography V, (5 September 1980); https://doi.org/10.1117/12.958617

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