Practical Aspects Of Automatic Mask Inspection

Richard P. Speck

doi:10.1117/12.958633

5 September 1980 Practical Aspects Of Automatic Mask Inspection

Richard P. Speck

Proceedings Volume 0221, Developments in Semiconductor Microlithography V; (1980) https://doi.org/10.1117/12.958633
Event: Semiconductor Microlithography V, 1980, San Jose, United States

Abstract

This paper evaluates a number of factors relevant to the mask manufacturer or user considering automatic mask inspection equipment. The emphasis is on inspection of ordinary production masks and mask blanks although extension of the design concepts to meet future VLSI needs is also considered. The performance of a commercial automatic mask inspection system which follows these design concepts is reviewed and related to the users objectives.

Citation Download Citation

Richard P. Speck "Practical Aspects Of Automatic Mask Inspection", Proc. SPIE 0221, Developments in Semiconductor Microlithography V, (5 September 1980); https://doi.org/10.1117/12.958633

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