Improving Photolithographic Tool Utilization Through An Advanced System Interface

Curtis B. Timmerman; John J. Festa; Randall M. Young

doi:10.1117/12.953155

25 July 1989 Improving Photolithographic Tool Utilization Through An Advanced System Interface

Curtis B. Timmerman, John J. Festa, Randall M. Young

Proceedings Volume 1088, Optical/Laser Microlithography II; (1989) https://doi.org/10.1117/12.953155
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

One of the major challenges facing the semiconductor industry today is to be able to respond to an increasingly competitive environment. One effective strategy is to reduce costs through advanced operation, maintenance, and information flow techniques for manufacturing equipment. This approach can yield very beneficial results for manufacturing economics.

Citation Download Citation

Curtis B. Timmerman, John J. Festa, and Randall M. Young "Improving Photolithographic Tool Utilization Through An Advanced System Interface", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); https://doi.org/10.1117/12.953155

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available