First demonstration of a 331-beam SEM

C. Riedesel; I. Müller; N. Kaufmann; A. Adolf; N. Kämmer; H. Fritz; A. L. Eberle; D. Zeidler

doi:10.1117/12.2528795

26 March 2019 First demonstration of a 331-beam SEM

C. Riedesel, I. Müller, N. Kaufmann, A. Adolf, N. Kämmer, H. Fritz, A. L. Eberle, D. Zeidler

Proceedings Volume 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII; 1095931 (2019) https://doi.org/10.1117/12.2528795
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

We have demonstrated the successful operation of a multi-beam scanning electron microscope with 331 electron beams for the first time. This makes it the world’s fastest SEM. The underlying architecture of the existing multi-beam mSEM technology fully supports the scale-up of the number of electron beams to 331. Scaling beyond this number is feasible.

Citation Download Citation

C. Riedesel, I. Müller, N. Kaufmann, A. Adolf, N. Kämmer, H. Fritz, A. L. Eberle, and D. Zeidler "First demonstration of a 331-beam SEM", Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 1095931 (26 March 2019); https://doi.org/10.1117/12.2528795

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