Laser-Induced Chemical Vapor Deposition of High-Purity Metals

Thomas H. Baum

doi:10.1117/12.963992

23 February 1990 Laser-Induced Chemical Vapor Deposition of High-Purity Metals

Thomas H. Baum

Proceedings Volume 1190, Laser/Optical Processing of Electronic Materials; (1990) https://doi.org/10.1117/12.963992
Event: 1989 Microelectronic Integrated Processing Conferences, 1989, Santa Clara, United States

Abstract

The laser chemical vapor deposition (LCVD) of aluminum and gold has been achieved via pyrolytic decomposition of trimethylamine aluminum hydride and dimethylgold (p-diketonates), respectively. The rates of metal deposition, the purity of the deposited metals and the electrical properties of the deposits are a direct result of the chemical and physical properties of the precursor and the metal.

Citation Download Citation

Thomas H. Baum "Laser-Induced Chemical Vapor Deposition of High-Purity Metals", Proc. SPIE 1190, Laser/Optical Processing of Electronic Materials, (23 February 1990); https://doi.org/10.1117/12.963992

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