Cross-functional photoresists and photopolymers enhancing micro- and nanofabrication

A. Schleunitz; C. Schuster; A. Voigt; M. Russew; M. Lohse; M. Heinrich; G. Grützner

doi:10.1117/12.2661531

30 April 2023 Cross-functional photoresists and photopolymers enhancing micro- and nanofabrication

A. Schleunitz, C. Schuster, A. Voigt, M. Russew, M. Lohse, M. Heinrich, G. Grützner

Author Affiliations +

Proceedings Volume 12497, Novel Patterning Technologies 2023; 124970V (2023) https://doi.org/10.1117/12.2661531
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Conference Poster

Abstract

The ongoing advancement of lithographic manufacturing in micro- and nanopatterning rely on the commercial availability of innovative photoresists, polymers and photopolymers as well as complementary process chemicals: This allows to enhance current micro- and nanofabrication technologies by increasing the overall pattern complexity or general process simplicity. In this contribution, we demonstrate that material innovations have a significant part in enhancing micro- and nanofabrication by outperforming generic photoresists through cross-functionality as it is increasingly required in ever growing pattern complexity (e.g. advanced mix-and-match methods) or when additional material features are set by the final application.

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A. Schleunitz, C. Schuster, A. Voigt, M. Russew, M. Lohse, M. Heinrich, and G. Grützner "Cross-functional photoresists and photopolymers enhancing micro- and nanofabrication", Proc. SPIE 12497, Novel Patterning Technologies 2023, 124970V (30 April 2023); https://doi.org/10.1117/12.2661531

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