Evaluation of EBR-9 resist

Naoya Hayashi

doi:10.1117/12.3011899

20 December 2023 Evaluation of EBR-9 resist

Naoya Hayashi

Author Affiliations +

Proceedings Volume 12809, Bay Area Chrome Users Society Symposium 1985; 128090E (2023) https://doi.org/10.1117/12.3011899
Event: 5th Annual BACUS Symposium, 1985, Sunnyvale, CA, United States

Abstract

There are many commercial positive type electron beam resists available for mask making. The most commonly used resist in the United States is the PBS type. U.S. mask makers seem to prefer this type because of its high sensitivity and high throughput in regard to E-Beam writing time. However, there are difficulties and instabilities exhibited by PBS during the process cycle which cause major concerns. Mask makers in Japan use EBR-9 as their primary positive E-Beam resist for production of reticles, masters, and sub-micron masks. With regard to processing and other factors, such as shelf life, adhesion, defect density, etc., EBR-9 has proven much more stable than PBS. The major concern with EBR-9 has been its lower sensitivity (about 5uc/cm sq.), which reduces the electron-beam system's throughput. This paper will present an evaluation of EBR-9 resist for mask production and techniques which give EBR-9 sensitivity and throughput comparable to PBS.

Citation Download Citation

Naoya Hayashi "Evaluation of EBR-9 resist", Proc. SPIE 12809, Bay Area Chrome Users Society Symposium 1985, 128090E (20 December 2023); https://doi.org/10.1117/12.3011899

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