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29 September 2023 Study of photomask manufacture process based on AI technology
Hiroshi Nakata, Ikuo Kikuchi, Noriko Baba, Maiko Hikichi, Shingo Yoshikawa
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Proceedings Volume 12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology; 129150P (2023) https://doi.org/10.1117/12.2684945
Event: Photomask Japan 2023, 2023, Online Only
Abstract
Today, the semiconductor industry is booming, because data centers, state-of-the-art devices, power semiconductors, etc. have high demand. In particular, EUV is leading the industry as a novel technology for advanced lithography. On the other hand, mature product lines are also supporting the overall semiconductor industry as a whole. Photomasks have become a very important key parameter for the semiconductor industry. The manufacture of photomasks with stable quality and on-time delivery is essential for stable chip production, but it is very challenging to identify manufacturing problems because of the wide variety of photomasks and patterns. In this study, we established a methodology to analyze the data of various equipment, processes, and materials in photomask manufacturing, and obtained various improvement results using Digital Transformation.
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Hiroshi Nakata, Ikuo Kikuchi, Noriko Baba, Maiko Hikichi, and Shingo Yoshikawa "Study of photomask manufacture process based on AI technology", Proc. SPIE 12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150P (29 September 2023); https://doi.org/10.1117/12.2684945
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KEYWORDS
Machine learning
Photomasks
Data modeling
Manufacturing
Particles
Artificial intelligence
Vacuum chambers
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