Three-dimensional global uniformity control in plasma etcher using multi parameter profile characterization technique based on CD-SEM image

Makoto Satake; Chisaki Takubo; Tadashi Okumura; Kenji Yasui; Hitoshi Namai; Takahiro Kawasaki; Mayuka Osaki; Maki Tanaka

doi:10.1117/12.3011778

10 April 2024 Three-dimensional global uniformity control in plasma etcher using multi parameter profile characterization technique based on CD-SEM image

Makoto Satake, Chisaki Takubo, Tadashi Okumura, Kenji Yasui, Hitoshi Namai, Takahiro Kawasaki, Mayuka Osaki, Maki Tanaka

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Proceedings Volume 12955, Metrology, Inspection, and Process Control XXXVIII; 129553K (2024) https://doi.org/10.1117/12.3011778
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

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Makoto Satake, Chisaki Takubo, Tadashi Okumura, Kenji Yasui, Hitoshi Namai, Takahiro Kawasaki, Mayuka Osaki, and Maki Tanaka "Three-dimensional global uniformity control in plasma etcher using multi parameter profile characterization technique based on CD-SEM image", Proc. SPIE 12955, Metrology, Inspection, and Process Control XXXVIII, 129553K (10 April 2024); https://doi.org/10.1117/12.3011778

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