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Block copolymers (BCP) self-assemble into a variety of microstructures and controlling the orientation of these structures relative to the substrate surface allows for their use in lithographic techniques. Control over the orientation is non-trivial and requires chemical treatment of the substrate or external fields that can interact and orient these BCP microstructure domains. With this research we highlight a facile thin film casting methodology that produces and orients diblock copolymer microstructure perpendicular to the substrate in the casting process itself. The films are cast from a solvent mixture with a block selective Ionic Liquid (IL) that plasticizes the BCP, enhances repulsive interactions between blocks, and screens preferential interactions between the BCP and the substrate. With a well-developed and fully perpendicular microstructure these films can find applications in sub-20nm lithography processes and as ultrafiltration membranes after selectively etching out the assembled domains.
Conference Presentation
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
K. Sharma,K. B. Shaik,C. Zhu,J. Strzalka, andA. Karim
"Ionic liquid mediated directed self-assembly of diblock/triblock copolymer thin films for advanced lithography", Proc. SPIE 12956, Novel Patterning Technologies 2024, 129560E (9 April 2024); https://doi.org/10.1117/12.3010938
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K. Sharma, K. B. Shaik, C. Zhu, J. Strzalka, A. Karim, "Ionic liquid mediated directed self-assembly of diblock/triblock copolymer thin films for advanced lithography," Proc. SPIE 12956, Novel Patterning Technologies 2024, 129560E (9 April 2024); https://doi.org/10.1117/12.3010938