Track oriented chemically-amplified resist processes for quarter-micron lithography

Michael T. Reilly; Azalia A. Krasnoperova; Quinn J. Leonard; James Welch Taylor; Shaowie Pan

doi:10.1117/12.154768

15 September 1993 Track oriented chemically-amplified resist processes for quarter-micron lithography

Michael T. Reilly, Azalia A. Krasnoperova, Quinn J. Leonard, James Welch Taylor, Shaowie Pan

Proceedings Volume 1925, Advances in Resist Technology and Processing X; (1993) https://doi.org/10.1117/12.154768
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

The establishment of standard resist processes are a primary requirement for the X-ray Lithography National Test Bed at the Center for X-ray Lithography. For this, experimental design is a necessary component of the methodology given the large parameter space associated with chemically amplified resists (CARs). The process development is carried out in three phases. DOX is applied to several steps in the development. The vacuum hot plate pre-bake, post-bake time, temperature and the exposure dose have the greatest effect on controlling the performance of the resist. Constraints are placed on the contrast, develop time and unexposed resist loss. The exposure dose needed to meet these requirements is obtained from the modified response surface of the bulk behavior. The final optimization is based on the CD control and side wall angle for quarter-micron features in resist. The process is run on a sampled basis in order to determine the control issues. Control limits are set from these data, and the process performance is determined.

Citation Download Citation

Michael T. Reilly, Azalia A. Krasnoperova, Quinn J. Leonard, James Welch Taylor, and Shaowie Pan "Track oriented chemically-amplified resist processes for quarter-micron lithography", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154768

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
7 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photoresist processing

X-ray lithography

Lithography

Standards development

Photomasks

Algorithm development

Data processing

Show All Keywords

Keywords/Phrases

Search In:

Publication Years