Laser maskless formation of submicrometer periodic relief gratings on AIIIBV semiconductor wafers by combination of holographic and surface electromagnetic wave generation methods

Vladislav Ya. Panchenko; Alexander I. Khudobenko; Vladimir N. Seminogov

doi:10.1117/12.237765

8 April 1996 Laser maskless formation of submicrometer periodic relief gratings on A^IIIB^V semiconductor wafers by combination of holographic and surface electromagnetic wave generation methods

Vladislav Ya. Panchenko, Alexander I. Khudobenko, Vladimir N. Seminogov

Author Affiliations +

Proceedings Volume 2703, Lasers as Tools for Manufacturing of Durable Goods and Microelectronics; (1996) https://doi.org/10.1117/12.237765
Event: Photonics West '96, 1996, San Jose, CA, United States

Abstract

The review of experimental investigations on maskless formation of submicron periodic relief structures on A^IIIB^V semiconductor surfaces (period d equals 230 - 800 nm), carried out in the Scientific Research Center for Technological Lasers of Russian Academy of Sciences during the last two years, is presented.

Citation Download Citation

Vladislav Ya. Panchenko, Alexander I. Khudobenko, and Vladimir N. Seminogov "Laser maskless formation of submicrometer periodic relief gratings on A^IIIB^V semiconductor wafers by combination of holographic and surface electromagnetic wave generation methods", Proc. SPIE 2703, Lasers as Tools for Manufacturing of Durable Goods and Microelectronics, (8 April 1996); https://doi.org/10.1117/12.237765

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