Photoablation of a graphite target using a KrF excimer laser and application to deposition of hard-carbon thin films

Alain Catherinot; C. Germain; J. Aubreton

doi:10.1117/12.232205

11 March 1996 Photoablation of a graphite target using a KrF excimer laser and application to deposition of hard-carbon thin films

Alain Catherinot, C. Germain, J. Aubreton

Author Affiliations +

Proceedings Volume 2777, ALT'95 International Symposium on Advanced Materials for Optics and Optoelectronics; (1996) https://doi.org/10.1117/12.232205
Event: ALT '95 International Conference: Advanced Materials for Optics and Optoelectronics, 1995, Prague, Czech Republic

Abstract

The plasma plume created during the interaction of a KrF laser beam (248 nm) with a graphite target under high-vacuum conditions has been investigated using temporally and spatially resolved spectroscopy and time-of-flight charged particle detection. Measurements lead to information on nature and kinetic energy of ejected particles. Hard carbon films are deposited on various substrates located in front to the target and their properties are investigated. These properties are found close to those of diamond (hardness equals 80 GPa, infrared transparency greater than 90%) when deposition temperature is low (less than 100 degrees Celsius).

Citation Download Citation

Alain Catherinot, C. Germain, and J. Aubreton "Photoablation of a graphite target using a KrF excimer laser and application to deposition of hard-carbon thin films", Proc. SPIE 2777, ALT'95 International Symposium on Advanced Materials for Optics and Optoelectronics, (11 March 1996); https://doi.org/10.1117/12.232205

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