Performance data obtained on a new mask metrology tool

Klaus-Dieter Roeth; Carola Blaesing-Bangert; John M. Whittey

doi:10.1117/12.262819

27 December 1996 Performance data obtained on a new mask metrology tool

Klaus-Dieter Roeth, Carola Blaesing-Bangert, John M. Whittey

Proceedings Volume 2884, 16th Annual BACUS Symposium on Photomask Technology and Management; (1996) https://doi.org/10.1117/12.262819
Event: 16th Annual BACUS Symposium on Photomask Technology and Management, 1996, Redwood City, CA, United States

Abstract

A new mask and wafer metrology tool is under final development at Leica to be launched in 1996. Recent performance data on the LMS IPRO system at Leica's development center shows precision and accuracy performance required for the 0.18 micrometers design rule device generation.

Citation Download Citation

Klaus-Dieter Roeth, Carola Blaesing-Bangert, and John M. Whittey "Performance data obtained on a new mask metrology tool", Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); https://doi.org/10.1117/12.262819

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