Large-field, high-resolution photolithography

Francis S. M. Clube; Simon Gray; Denis Struchen; Stephane Malfoy; Yves Darbellay; Nicolas Magnon; Bertrand Le Gratiet; Jean-Claude Tisserand

doi:10.1117/12.281232

24 September 1997 Large-field high-resolution photolithography

Francis S. M. Clube, Simon Gray, Denis Struchen, Stephane Malfoy, Yves Darbellay, Nicolas Magnon, Bertrand Le Gratiet, Jean-Claude Tisserand

Author Affiliations +

Proceedings Volume 3099, Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications; (1997) https://doi.org/10.1117/12.281232
Event: Lasers and Optics in Manufacturing III, 1997, Munich, Germany

Abstract

Holographic lithography's unique capacity for high- resolution and large-area pattern transfer offers significant advantages for fabricating a range of optical microsystems. Two industrialized models of lithographic system have been constructed. The first has an imaging resolution of 0.25 micrometers over an exposure field of 6' X 6' and can print onto a variety of substrate types of dimensions up to 6' X 6'. It includes an alignment system permitting a pattern-to-pattern overlay accuracy of 0.3 micrometers (3(sigma) value). The second model combines an imaging resolution of 0.25 micrometers with an exposure field of 10' X 12' and prints onto substrates up to 470 mm X 370 mm. This system has a substrate stepping capability allowing a pattern to be replicated many times onto the substrate, and an alignment system providing 0.5 micrometers overlay accuracy. Both models operate at an exposure wavelength of 364 nm, making them compatible with standard i-line photoresist processing. The technology has been successfully employed for printing grating structures with periods down to 0.5 micrometers for such applications as high-resolution encoders and optical interconnects.

Citation Download Citation

Francis S. M. Clube, Simon Gray, Denis Struchen, Stephane Malfoy, Yves Darbellay, Nicolas Magnon, Bertrand Le Gratiet, and Jean-Claude Tisserand "Large-field high-resolution photolithography", Proc. SPIE 3099, Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications, (24 September 1997); https://doi.org/10.1117/12.281232

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