Paper
3 June 1998 Materials study for technically relevant devices fabricated by excimer ablation lithography
Christina Hahn, Thilo Kunz, Alexander J. Wokaun
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Abstract
As polymers tailored for laser ablation at a specific wavelength usually require a costly synthesis that makes them expensive, standard materials are investigated in the present study that are already produced on a large scale. Apart from an absorption band around the laser wavelength (here, 308 nm) further properties are important in technical applications, such as thermal and photochemical stability or optical transparency. High etching rates combined with high quality structuring are required for photon-efficient ablation. Depending on these criteria we chose several standard materials, which are commercially available, and characterized the ablation behavior. The substrates include polymers such as polycarbonates, polymer blends, and in addition glassy carbon substrates, which are wide-spread in industrial appliances already and promising for devices fabricated by excimer ablation lithography. The characteristic parameters were determined and the quality of the obtained structure was investigated by scanning-electron- and atomic-force-microscopy. Examples of applications in microtechnology will be shown.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christina Hahn, Thilo Kunz, and Alexander J. Wokaun "Materials study for technically relevant devices fabricated by excimer ablation lithography", Proc. SPIE 3274, Laser Applications in Microelectronic and Optoelectronic Manufacturing III, (3 June 1998); https://doi.org/10.1117/12.309516
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KEYWORDS
Polymers

Laser ablation

Carbon

Etching

Scanning electron microscopy

Absorption

Photomicroscopy

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