Precise microfabrication of wide-bandgap materials by VUV-UV multiwavelength ablation

Koji Sugioka; Jie Zhang; Satoshi Wada; Hideo Tashiro; Katsumi Midorikawa; Koichi Toyoda

doi:10.1117/12.309493

3 June 1998 Precise microfabrication of wide-bandgap materials by VUV-UV multiwavelength ablation

Koji Sugioka, Jie Zhang, Satoshi Wada, Hideo Tashiro, Katsumi Midorikawa, Koichi Toyoda

Author Affiliations +

Proceedings Volume 3274, Laser Applications in Microelectronic and Optoelectronic Manufacturing III; (1998) https://doi.org/10.1117/12.309493
Event: Optoelectronics and High-Power Lasers and Applications, 1998, San Jose, CA, United States

Abstract

Novel ablation of wide band gap materials such as fused quartz by multiwavelength excitation using a VUV-UV laser system is reviewed. Simultaneous irradiation of VUV and UV laser beams emitted from a VUV Raman laser presents great potential for precise microfabrication of the materials. The mechanism and the role of VUV beams in this process are made clear on the basis of band structure. Furthermore, the advantages of this technique are discussed in comparison with the conventional single wavelength ablation. This technique is applied to selected area removal of SiO₂ films on Al lines for repair of Si integrated circuits.

Citation Download Citation

Koji Sugioka, Jie Zhang, Satoshi Wada, Hideo Tashiro, Katsumi Midorikawa, and Koichi Toyoda "Precise microfabrication of wide-bandgap materials by VUV-UV multiwavelength ablation", Proc. SPIE 3274, Laser Applications in Microelectronic and Optoelectronic Manufacturing III, (3 June 1998); https://doi.org/10.1117/12.309493

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