Paper
25 August 1999 Enhancement of hierarchical mask data design system (PROPHET)
Takahiro Watanabe, Eiji Tsujimoto, Keiji Maeda, Hiroshi Fukuda
Author Affiliations +
Abstract
Several new features have been added to the aerial image simulation function of PROPHET due to process engineers' request for more precise evaluation of simulation results. In the previous version, only contour lines of light intensity were shown in the layout editor window. This new version of PROPHET can show a cross sectional display of two dimensional light intensity on any user specified line segment with the aid of layout editor. Line width measurement, light intensity measurement and multiple exposure simulation can be done by utilizing the two dimensional light intensity data file previously used only to draw contour lines. The optimal coherent approximation (OCA) reduces simulation time to 1/50 in high sigma region. A Fickian diffusion of the light intensity profile and a simple resist processing model gives more precise simulation results.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takahiro Watanabe, Eiji Tsujimoto, Keiji Maeda, and Hiroshi Fukuda "Enhancement of hierarchical mask data design system (PROPHET)", Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); https://doi.org/10.1117/12.360191
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CITATIONS
Cited by 2 scholarly publications and 2 patents.
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KEYWORDS
Process engineering

Optical testing

Diffusion

Image processing

Semiconducting wafers

Image enhancement

Optical proximity correction

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