Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology

Udo Dinger; Frank Eisert; Holger Lasser; Maximilian Mayer; A. Seifert; Guenther Seitz; Siegfried Stacklies; Franz-Josef Stickel; Martin Weiser

doi:10.1117/12.406674

8 November 2000 Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology

Udo Dinger, Frank Eisert, Holger Lasser, Maximilian Mayer, A. Seifert, Guenther Seitz, Siegfried Stacklies, Franz-Josef Stickel, Martin Weiser

Author Affiliations +

Proceedings Volume 4146, Soft X-Ray and EUV Imaging Systems; (2000) https://doi.org/10.1117/12.406674
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

In this paper, the metrology and fabrication concepts at Carl Zeiss will be reviewed. The present status in the fabrication of specific EUVL mirrors will be reported as well.

Citation Download Citation

Udo Dinger, Frank Eisert, Holger Lasser, Maximilian Mayer, A. Seifert, Guenther Seitz, Siegfried Stacklies, Franz-Josef Stickel, and Martin Weiser "Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology", Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); https://doi.org/10.1117/12.406674

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