Mr. Günther K. Seitz Profile

Günther K. Seitz

at Carl Zeiss SMT AG

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 18 October 2004 Paper

EUV microlithography: a challenge for optical metrology

Gunther Seitz, Stefan Schulte, Udo Dinger, Oliver Hocky, Bernhard Fellner, Markus Rupp

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.556317

KEYWORDS: Interferometers, Aspheric lenses, Wavefronts, Mirrors, Extreme ultraviolet, Error analysis, Extreme ultraviolet lithography, Imaging systems, Diffraction, Calibration

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Proceedings Article | 13 January 2004 Paper

Fabrication and metrology of diffraction-limited soft x-ray optics for the EUV microlithography

Udo Dinger, Guenther Seitz, Stefan Schulte, Frank Eisert, Christian Muenster, Stefan Burkart, Siegfried Stacklies, Christian Bustaus, Hubert Hoefer, Maximilian Mayer, Bernhard Fellner, Oliver Hocky, Markus Rupp, Klaus Riedelsheimer, Peter Kuerz

Proceedings Volume 5193, (2004) https://doi.org/10.1117/12.511489

KEYWORDS: Mirrors, Metrology, Extreme ultraviolet lithography, Aspheric lenses, Imaging systems, Wavefronts, Scattering, Off axis mirrors, Reflectivity, Interferometers

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Proceedings Article | 8 November 2000 Paper

Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology

Udo Dinger, Frank Eisert, Holger Lasser, Maximilian Mayer, A. Seifert, Guenther Seitz, Siegfried Stacklies, Franz-Josef Stickel, Martin Weiser

Proceedings Volume 4146, (2000) https://doi.org/10.1117/12.406674

KEYWORDS: Mirrors, Aspheric lenses, Metrology, Extreme ultraviolet lithography, Interferometers, Imaging systems, Reflectivity, Calibration, Optical spheres, Wavefronts

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SPIE Journal Paper | 1 June 1993

Resolution limits of active triangulation systems by defocusing

Guenther Seitz, Hans Tiziani

OE, Vol. 32, Issue 06, (June 1993) https://doi.org/10.1117/12.10.1117/12.133241

KEYWORDS: Point spread functions, Imaging systems, Geometrical optics, Image processing, Wavefronts, Ray tracing, Scattering, Diffraction, Error analysis, Coherence imaging

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Conference Committee Involvement (1)

Advances in Metrology for X-Ray and EUV Optics

2 August 2005 | San Diego, California, United States

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