Vacuum delay effect of CAR in mask fabrication

Chang-Hwan Kim; Chan-Uk Jeon; Sung-Jae Han; Won-Il Cho; Seong-Woon Choi; Woo-Sung Han; Jung-Min Sohn

doi:10.1117/12.436658

20 August 2001 Vacuum delay effect of CAR in mask fabrication

Chang-Hwan Kim, Chan-Uk Jeon, Sung-Jae Han, Won-Il Cho, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4343, Emerging Lithographic Technologies V; (2001) https://doi.org/10.1117/12.436658
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Delay effects were evaluated for various chemically amplified resist (CAR) types in view of exposure conditions, vacuum and atmosphere. Since the mask is exposed in the vacuum chamber for a long period of time, unexpected phenomenon has been emerging in CAR such as pattern degradation, line width variation owing to vacuum delay effect (VDE). In the acetal resist based on ethyl vinyl ether (EVE), the VDE emerges as space CD decrease, while post exposure delay (PED) in an optical process shows space CD increase. Acrylate resist and modified acetal resist are superior in VDE as well as PED to EVE resist. VDE seems to be caused by out-gassing. It can be overcome by choosing out-gassing free chemistry such as acrylate and modified acetal. An over-coating method was evaluated to prevent any volatile materials in CAR from being evaporated in the vacuum, but it is disclosed ineffective to VDE. CAR linearity reaches to 0.2micrometers , and its resist and Cr pattern as well as OPC was equivalent to current e-beam resist, ZEP7000. Finally, we can have achieve 8.3nm CD non- uniformity in 3(sigma) in 135*135 mm² area that allows beyond 0.13micrometers device mask application.

Citation Download Citation

Chang-Hwan Kim, Chan-Uk Jeon, Sung-Jae Han, Won-Il Cho, Seong-Woon Choi, Woo-Sung Han, and Jung-Min Sohn "Vacuum delay effect of CAR in mask fabrication", Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); https://doi.org/10.1117/12.436658

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