Paper
9 April 2001 Electron-beam lithography data preparation based on multithreading MGS/PROXECCO
Hans Eichhorn, Melchior Lemke, Juergen Gramss, B. Buerger, Uwe Baetz, Nikola Belic, Hans Eisenmann
Author Affiliations +
Proceedings Volume 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2001) https://doi.org/10.1117/12.425088
Event: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 2000, Munich, Germany
Abstract
This paper will highlight an enhanced MGS layout data post processor and the results of its industrial application. Besides the preparation of hierarchical GDS layout data, the processing of flat data has been drastically accelerated. The application of the Proximity Correction in conjunction with the OEM version of the PROXECCO was crowned with success for data preparation of mask sets featuring 0.25 micrometers /0.18 micrometers integration levels.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hans Eichhorn, Melchior Lemke, Juergen Gramss, B. Buerger, Uwe Baetz, Nikola Belic, and Hans Eisenmann "Electron-beam lithography data preparation based on multithreading MGS/PROXECCO", Proc. SPIE 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (9 April 2001); https://doi.org/10.1117/12.425088
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KEYWORDS
Magnesium

Computing systems

Data processing

Lithography

Sun

Optical proximity correction

Photomasks

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