Paper
28 May 2004 Cost of ownership reduction for OPC development and production
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Abstract
The cost of developing and deploying optical proximity correction (OPC) technology has become a non-negligible part of the total lithography cost of ownership (CoO). In this paper, we present our efforts to reduce costs associated with OPC in the development phase for the 90nm node, and production phase for the 130nm node.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chi-Min Yuan, Bob Jarvis, Kevin D. Lucas, Robert Boone, Ruiqi Tian, and Alfred Reich "Cost of ownership reduction for OPC development and production", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.535279
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KEYWORDS
Optical proximity correction

Lithography

Optical lithography

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