High-accuracy VUV reflectometry at selectable sample temperatures

Alexander Gottwald; Udo Kroth; Martin Letz; Hendrik Schoppe; Mathias Richter

doi:10.1117/12.556301

14 October 2004 High-accuracy VUV reflectometry at selectable sample temperatures

Alexander Gottwald, Udo Kroth, Martin Letz, Hendrik Schoppe, Mathias Richter

Proceedings Volume 5538, Optical Constants of Materials for UV to X-Ray Wavelengths; (2004) https://doi.org/10.1117/12.556301
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States

Abstract

Characterization of optical materials and components is one of the major tasks for the Radiometry Laboratory of the Physikalisch-Technische Bundesanstalt, Germany's national metrology institute, at the synchrotron radiation source BESSY II. Using spectrally dispersed synchrotron radiation, reflectometry measurements have been performed on highly pure CaF2 crystals in the VUV spectral region between 90 nm and 130 nm wavelength in the vicinity of the absorption edge. Here, the optical constants are influenced by an excitonic resonance directly correlated to the recently found anisotropy of the crystal at 157-nm wavelength. To investigate temperature-dependent effects, the reflectometer sample holder has been equipped with a heater/cooler stage, which currently enables measurements at stable temperatures in the range between -50° C and 80° C.

Citation Download Citation

Alexander Gottwald, Udo Kroth, Martin Letz, Hendrik Schoppe, and Mathias Richter "High-accuracy VUV reflectometry at selectable sample temperatures", Proc. SPIE 5538, Optical Constants of Materials for UV to X-Ray Wavelengths, (14 October 2004); https://doi.org/10.1117/12.556301

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