InP based QCL in MBE production machine

Michel Garcia; Francois Julien Vermersch; Xavier Marcadet; Shailendra Bansropun; Mathieu Carras; Arnaud Wilk; Christine Chaix; Carlo Sirtori

doi:10.1117/12.645943

22 February 2006 InP based QCL in MBE production machine

Michel Garcia, Francois Julien Vermersch, Xavier Marcadet, Shailendra Bansropun, Mathieu Carras, Arnaud Wilk, Christine Chaix, Carlo Sirtori

Author Affiliations +

Proceedings Volume 6133, Novel In-Plane Semiconductor Lasers V; 613304 (2006) https://doi.org/10.1117/12.645943
Event: Integrated Optoelectronic Devices 2006, 2006, San Jose, California, United States

Abstract

Quantum Cascade Lasers (QCL), emitting between 5 and 9 μm, have been realised with a view to achieving QCLs fabrication on a production scale. The growth of the structures was carried out in a multi-wafer RIBER 49 system (13 x 2" platen), and the processing sequence involved an Inductively Coupled Plasma (ICP) step for homogeneity and reproducibility purposes. To validate the approach used, a first batch of lasers, emitting around 9μm, based on a design already published [1], has been realised. State of the art performance on these devices (J_th = 4.2 kA cm^-2, η = 304 mW A^-1, P_max = 690 mW) has been achieved. A second set of strained balanced structures, emitting around 5.4μm, has been demonstrated, working in pulsed operation at room temperature(J_th = 3.9 kA cm^-2, η = 362 mW A^-1, P_max = 420 mW).

Citation Download Citation

Michel Garcia, Francois Julien Vermersch, Xavier Marcadet, Shailendra Bansropun, Mathieu Carras, Arnaud Wilk, Christine Chaix, and Carlo Sirtori "InP based QCL in MBE production machine", Proc. SPIE 6133, Novel In-Plane Semiconductor Lasers V, 613304 (22 February 2006); https://doi.org/10.1117/12.645943

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