Evaluation of 193nm immersion resist without topcoat

Yayi Wei; N. Stepanenko; A. Laessig; L. Voelkel; M. Sebald

doi:10.1117/12.655664

29 March 2006 Evaluation of 193nm immersion resist without topcoat

Yayi Wei, N. Stepanenko, A. Laessig, L. Voelkel, M. Sebald

Proceedings Volume 6153, Advances in Resist Technology and Processing XXIII; 615305 (2006) https://doi.org/10.1117/12.655664
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

193nm immersion resist without topcoat is production preferred solution. The challenge of 193nm immersion resist is both low leaching level and high performance. This paper summarizes the screening results of selected 193nm immersion resists which are designed for use without top coatings. Our evaluation is divided into several phases. Leaching levels of resist samples were first tested. The leaching data were analyzed and compared to our specifications. Both binary image mask and alternating phase-shift mask exposures were done to evaluate the process window, line-edge roughness, and resist pattern profile. Resist films were rinsed by DI water prior to or after exposure, and contrast curves were measured to investigate the resist sensitivity change. The results are compared with resist systems which use developer-soluble topcoats.

Citation Download Citation

Yayi Wei, N. Stepanenko, A. Laessig, L. Voelkel, and M. Sebald "Evaluation of 193nm immersion resist without topcoat", Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 615305 (29 March 2006); https://doi.org/10.1117/12.655664

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