Advanced dry and steam laser cleaning of opaque and transparent critical substrates

Sergey Kudryashov; Shishir Shukla; Kevin Lyon; Susan D. Allen

doi:10.1117/12.669613

7 June 2006 Advanced dry and steam laser cleaning of opaque and transparent critical substrates

Sergey Kudryashov, Shishir Shukla, Kevin Lyon, Susan D. Allen

Proceedings Volume 6261, High-Power Laser Ablation VI; 62610D (2006) https://doi.org/10.1117/12.669613
Event: High-Power Laser Ablation 2006, 2006, Taos, NM, United States

Abstract

Dry and steam laser cleaning, DLC and SLC, of nano-and micro-contaminant particles from UV/vis opaque and transparent critical substrates has been studied in front-side laser illumination geometry with the help of time-resolved optical techniques and broadband photoacoustic spectroscopy using a nanosecond 10.6-μm TEA CO₂-laser and different absorbing energy transfer media (ETM) fluids. Corresponding basic DLC and SLC mechanisms for removal of nano- and micro-particles from opaque and transparent critical substrates as well as parameters of explosive removal of ETM fluids have been determined and discussed.

Citation Download Citation

Sergey Kudryashov, Shishir Shukla, Kevin Lyon, and Susan D. Allen "Advanced dry and steam laser cleaning of opaque and transparent critical substrates", Proc. SPIE 6261, High-Power Laser Ablation VI, 62610D (7 June 2006); https://doi.org/10.1117/12.669613

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