Fluoro-alcohol materials with tailored interfacial properties for immersion lithography

Daniel P. Sanders; Linda K. Sundberg; Ratnam Sooriyakumaran; Phillip J. Brock; Richard A. DiPietro; Hoa D. Truong; Dolores C. Miller; Margaret C. Lawson; Robert D. Allen

doi:10.1117/12.712768

2 April 2007 Fluoro-alcohol materials with tailored interfacial properties for immersion lithography

Daniel P. Sanders, Linda K. Sundberg, Ratnam Sooriyakumaran, Phillip J. Brock, Richard A. DiPietro, Hoa D. Truong, Dolores C. Miller, Margaret C. Lawson, Robert D. Allen

Author Affiliations +

Proceedings Volume 6519, Advances in Resist Materials and Processing Technology XXIV; 651904 (2007) https://doi.org/10.1117/12.712768
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Immersion lithography has placed a number of additional performance criteria on already stressed resist materials. Much work over the past few years has shown that controlling the water-resist interface is critical to enabling high scan rates (i.e. throughput) while minimizing film pulling and PAG extraction (i.e. defectivity). Protective topcoat polymers were developed to control the aforementioned interfacial properties and emerged as key enablers of 193 nm immersion lithography. Achieving the delicate balance between the low surface energies required for high water contact angles (generally achieved via the incorporation of fluorinated groups) and the base solubility required for topcoat removal is challenging. More recently, additional strategies using fluoropolymer materials to control the water-resist interface have been developed to afford topcoat-free resist systems. In our explorations of fluoroalcohol-based topcoat materials, we have discovered a number of structure-property relationships of which advantage can be taken to tailor the interfacial properties of these fluorinated materials. This paper will address the effect of structure on immersion specific properties such as water contact angle, aqueous base contact angle, and dissolution rate.

Citation Download Citation

Daniel P. Sanders, Linda K. Sundberg, Ratnam Sooriyakumaran, Phillip J. Brock, Richard A. DiPietro, Hoa D. Truong, Dolores C. Miller, Margaret C. Lawson, and Robert D. Allen "Fluoro-alcohol materials with tailored interfacial properties for immersion lithography", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 651904 (2 April 2007); https://doi.org/10.1117/12.712768

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available