Photonic wires sidewall roughness measures using atomic force microscope capabilities

Radu Malureanu; Lars Hagedorn Frandsen

doi:10.1117/12.778874

25 April 2008 Photonic wires sidewall roughness measures using atomic force microscope capabilities

Proceedings Volume 6995, Optical Micro- and Nanometrology in Microsystems Technology II; 69950R (2008) https://doi.org/10.1117/12.778874
Event: SPIE Photonics Europe, 2008, Strasbourg, France

Abstract

Within the last years, interest in photonic wires and photonic crystals grew due to their demonstrated ability of controlling light propagation and characteristics. One of the limitations of such devices is due to the induced roughness during the fabrication process. Generally, an increase in roughness leads to loss increase thus limiting the propagation length and postponing the commercialization of such structures. In this paper we present a new algorithm for measuring the sidewall roughness of our devices based on atomic force microscope (AFM) approach. Using this algorithm, the roughness can be quantified and thus actions in decreasing it can be taken improving the device's performance.

Citation Download Citation

Radu Malureanu and Lars Hagedorn Frandsen "Photonic wires sidewall roughness measures using atomic force microscope capabilities", Proc. SPIE 6995, Optical Micro- and Nanometrology in Microsystems Technology II, 69950R (25 April 2008); https://doi.org/10.1117/12.778874

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KEYWORDS

Atomic force microscopy

Photonic crystals

Calibration

Atomic force microscope

Error analysis

Etching

Radium

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