Paper
11 March 1987 Advances In Excimer Laser Lithography
Kanti Jain
Author Affiliations +
Proceedings Volume 0710, Excimer Lasers and Optics; (1987) https://doi.org/10.1117/12.937294
Event: Cambridge Symposium-Fiber/LASE '86, 1986, Cambridge, MA, United States
Abstract
This paper reviews the rapidly emerging field of excimer laser lithography. Beginning with the first contact printing experiments, developments in excimer laser projection printing on various commercial lithographic machines are reviewed. Recent results obtained with full-field scanning projection systems as well as step-and-repeat tools are summarized. Future directions in optical lithography are examined in view of these advances. Finally, a discussion of various key excimer laser parameters is presented from two points of view: availability, and requirements for various practical lithographic systems.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kanti Jain "Advances In Excimer Laser Lithography", Proc. SPIE 0710, Excimer Lasers and Optics, (11 March 1987); https://doi.org/10.1117/12.937294
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CITATIONS
Cited by 2 scholarly publications and 2 patents.
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KEYWORDS
Excimer lasers

Lithography

Printing

Gas lasers

Deep ultraviolet

Optical fibers

Semiconducting wafers

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