Dependence of laser parameter on conversion efficiency in high-repetition-rate laser-ablation-discharge EUV source

Yusuke Teramoto; Takuma Yokoyama; Hiroshi Mizokoshi; Hiroto Sato; Kazuaki Hotta

doi:10.1117/12.814460

18 March 2009 Dependence of laser parameter on conversion efficiency in high-repetition-rate laser-ablation-discharge EUV source

Yusuke Teramoto, Takuma Yokoyama, Hiroshi Mizokoshi, Hiroto Sato, Kazuaki Hotta

Author Affiliations +

Proceedings Volume 7271, Alternative Lithographic Technologies; 727139 (2009) https://doi.org/10.1117/12.814460
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Two projects are being conducted in EUVA under the support of NEDO and member companies; private project and national project. The private project is responsible for power improvement of a source module targeting realization of 115-W prototype. The national project covers wide area of remaining issues on a collector module to achieve sufficient reliability. In the private project, a laser-ablation-discharge-produced plasma (LADPP) is being researched as a candidate of high-power EUV source. LADPP has fascinating properties such as long lifetime, high collection efficiency, and high thermal input. More than 15 % of collection efficiency could be obtained with LADPP because of its small plasma size. Pulse repetition frequency has reached 20 kHz and 580 W/2πsr were achieved so far. In order to increase conversion efficiency (CE), detailed diagnostics of LADPP were carried out. Especially, dependence of CE on laser pulse duration is derived from the experiment. As a result, dynamics of LADPP was understood and solution to increase CE and improve frequency scalability was understood. A fundamental experiment predicted that CE can be increased 60 %.

Citation Download Citation

Yusuke Teramoto, Takuma Yokoyama, Hiroshi Mizokoshi, Hiroto Sato, and Kazuaki Hotta "Dependence of laser parameter on conversion efficiency in high-repetition-rate laser-ablation-discharge EUV source", Proc. SPIE 7271, Alternative Lithographic Technologies, 727139 (18 March 2009); https://doi.org/10.1117/12.814460

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