Imaging performance of EUV lithography optics configuration for sub-9nm resolution

Jens Timo Neumann; Matthias Rösch; Paul Gräupner; Sascha Migura; Bernhard Kneer; Winfried Kaiser; Koen van Ingen Schenau

doi:10.1117/12.2175658

16 March 2015 Imaging performance of EUV lithography optics configuration for sub-9nm resolution

Jens Timo Neumann, Matthias Rösch, Paul Gräupner, Sascha Migura, Bernhard Kneer, Winfried Kaiser, Koen van Ingen Schenau

Author Affiliations +

Proceedings Volume 9422, Extreme Ultraviolet (EUV) Lithography VI; 94221H (2015) https://doi.org/10.1117/12.2175658
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

New design solutions are available for high-NA EUV optics, maintaining simultaneously superior imaging performance and productivity below 9nm resolution by means of anamorphic imaging. We investigate the imaging properties of these new optics configurations by rigorous simulations, taking into account mask induced effects as well as characteristics of the new optics. We compare the imaging behavior to other, more traditional optics configurations, and show that the productivity gain of our new configurations is indeed obtained at excellent imaging performance.

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Jens Timo Neumann, Matthias Rösch, Paul Gräupner, Sascha Migura, Bernhard Kneer, Winfried Kaiser, and Koen van Ingen Schenau "Imaging performance of EUV lithography optics configuration for sub-9nm resolution", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94221H (16 March 2015); https://doi.org/10.1117/12.2175658

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