Carbon dioxide gas purification and analytical measurement for leading edge 193nm lithography

Sarah Riddle Vogt; Cristian Landoni; Chuck Applegarth; Matt Browning; Marco Succi; Simona Pirola; Giorgio Macchi

doi:10.1117/12.2085963

19 March 2015 Carbon dioxide gas purification and analytical measurement for leading edge 193nm lithography

Sarah Riddle Vogt, Cristian Landoni, Chuck Applegarth, Matt Browning, Marco Succi, Simona Pirola, Giorgio Macchi

Proceedings Volume 9424, Metrology, Inspection, and Process Control for Microlithography XXIX; 94242N (2015) https://doi.org/10.1117/12.2085963
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

The use of purified carbon dioxide (CO₂) has become a reality for leading edge 193 nm immersion lithography scanners. Traditionally, both dry and immersion 193 nm lithographic processes have constantly purged the optics stack with ultrahigh purity compressed dry air (UHPCDA). CO₂ has been utilized for a similar purpose as UHPCDA. Airborne molecular contamniation (AMC) purification technologies and analytical measurement methods have been extensively developed to support the Lithography Tool Manufacturers purity requirements. This paper covers the analytical tests and characterizations carried out to assess impurity removal from 3.0 N CO₂ (beverage grade) for its final utilization in 193 nm and EUV scanners.

Citation Download Citation

Sarah Riddle Vogt, Cristian Landoni, Chuck Applegarth, Matt Browning, Marco Succi, Simona Pirola, and Giorgio Macchi "Carbon dioxide gas purification and analytical measurement for leading edge 193nm lithography", Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94242N (19 March 2015); https://doi.org/10.1117/12.2085963

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