Material removal characteristics of orthogonal velocity polishing tool for efficient fabrication of CVD SiC mirror surfaces

Hyunju Seo; Jeong-Yeol Han; Sug-Whan Kim; Sehyun Seong; Siyoung Yoon; Kyungmook Lee; Haengbok Lee

doi:10.1117/12.2188805

8 September 2015 Material removal characteristics of orthogonal velocity polishing tool for efficient fabrication of CVD SiC mirror surfaces

Hyunju Seo, Jeong-Yeol Han, Sug-Whan Kim, Sehyun Seong, Siyoung Yoon, Kyungmook Lee, Haengbok Lee

Author Affiliations +

Proceedings Volume 9575, Optical Manufacturing and Testing XI; 95750N (2015) https://doi.org/10.1117/12.2188805
Event: SPIE Optical Engineering + Applications, 2015, San Diego, California, United States

Abstract

Today, CVD SiC mirrors are readily available in the market. However, it is well known to the community that the key surface fabrication processes and, in particular, the material removal characteristics of the CVD SiC mirror surface varies sensitively depending on the shop floor polishing and figuring variables. We investigated the material removal characteristics of CVD SiC mirror surfaces using a new and patented polishing tool called orthogonal velocity tool (OVT) that employs two orthogonal velocity fields generated simultaneously during polishing and figuring machine runs. We built an in-house OVT machine and its operating principle allows for generation of pseudo Gaussian shapes of material removal from the target surface. The shapes are very similar to the tool influence functions (TIFs) of other polishing machine such as IRP series polishing machines from Zeeko. Using two CVD SiC mirrors of 150 mm in diameter and flat surface, we ran trial material removal experiments over the machine run parameter ranges from 12.901 to 25.867 psi in pressure, 0.086 m/sec to 0.147 m/sec in tool linear velocity, and 5 to 15 sec in dwell time. An in-house developed data analysis program was used to obtain a number of Gaussian shaped TIFs and the resulting material removal coefficient varies from 3.35 to 9.46 um/psi hour m/sec with the mean value to 5.90 ± 1.26(standard deviation). We report the technical details of the new OVT machine, of the data analysis program, of the experiments and the results together with the implications to the future development of the OVT machine and process for large CVD SiC mirror surfaces.

Citation Download Citation

Hyunju Seo, Jeong-Yeol Han, Sug-Whan Kim, Sehyun Seong, Siyoung Yoon, Kyungmook Lee, and Haengbok Lee "Material removal characteristics of orthogonal velocity polishing tool for efficient fabrication of CVD SiC mirror surfaces", Proc. SPIE 9575, Optical Manufacturing and Testing XI, 95750N (8 September 2015); https://doi.org/10.1117/12.2188805

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available