Productivity enhancement and reliability through AutoAnalysis

Anthony Garetto; Thomas Rademacher; Kristian Schulz

doi:10.1117/12.2196651

4 September 2015 Productivity enhancement and reliability through AutoAnalysis

Anthony Garetto, Thomas Rademacher, Kristian Schulz

Proceedings Volume 9661, 31st European Mask and Lithography Conference; 96610M (2015) https://doi.org/10.1117/12.2196651
Event: 31st European Mask and Lithography Conference, 2015, Eindhoven, Netherlands

Abstract

The decreasing size and increasing complexity of photomask features, driven by the push to ever smaller technology nodes, places more and more challenges on the mask house, particularly in terms of yield management and cost reduction. Particularly challenging for mask shops is the inspection, repair and review cycle which requires more time and skill from operators due to the higher number of masks required per technology node and larger nuisance defect counts. While the measurement throughput of the AIMS™ platform has been improved in order to keep pace with these trends, the analysis of aerial images has seen little advancement and remains largely a manual process. This manual analysis of aerial images is time consuming, dependent on the skill level of the operator and significantly contributes to the overall mask manufacturing process flow.

AutoAnalysis, the first application available for the FAVOR® platform, offers a solution to these problems by providing fully automated analysis of AIMS™ aerial images. Direct communication with the AIMS™ system allows automated data transfer and analysis parallel to the measurements. User defined report templates allow the relevant data to be output in a manner that can be tailored to various internal needs and support the requests of your customers. Productivity is significantly improved due to the fast analysis, operator time is saved and made available for other tasks and reliability is no longer a concern as the most defective region is always and consistently captured. In this paper the concept and approach of AutoAnalysis will be presented as well as an update to the status of the project. The benefits arising from the use of AutoAnalysis will be discussed in more detail and a study will be performed in order to demonstrate.

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Anthony Garetto, Thomas Rademacher, and Kristian Schulz "Productivity enhancement and reliability through AutoAnalysis", Proc. SPIE 9661, 31st European Mask and Lithography Conference, 96610M (4 September 2015); https://doi.org/10.1117/12.2196651

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KEYWORDS

Photomasks

Image analysis

Manufacturing

Reliability

Inspection

Image processing

Telecommunications

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