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16 March 2024 Amorphous tellurite thin films prepared by sputtering
Anupama Viswanathan, Pradeep Ramanan, Jan Gutwirth, Laeticia Petit, Matthieu Roussey, Virginie Nazabal, Petr Nemec
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Proceedings Volume PC12887, Oxide-based Materials and Devices XV; PC128870P (2024) https://doi.org/10.1117/12.3002729
Event: SPIE OPTO, 2024, San Francisco, California, United States
Abstract
In the context of searching of new oxide materials for the application in the field of photonics sensors, this work is focused on the fabrication and characterization of tellurite thin films doped with erbium. For the deposition of amorphous TeO2-ZnO-(Bi2O3 or BaO or Na2O)-Er2O3 thin films with thickness around 700 nm, radio-frequency magnetron sputtering technique with Ar:O2 flow ratio = 40:10 sccm was exploited. The deposited films were characterized in detail via X-ray diffraction, atomic force microscopy, profilometry, transmission spectroscopy, variable angle spectroscopic ellipsometry, scanning eectron microscopy with energy-dispersive X-ray analysis and luminescence spectroscopy. The results are discussed in relation with the chemical composition of the fabricated thin films. The financial support from the European Union’s Horizon Europe Framework Programme under grant agreement No 101092723 is greatly acknowledged.
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Anupama Viswanathan, Pradeep Ramanan, Jan Gutwirth, Laeticia Petit, Matthieu Roussey, Virginie Nazabal, and Petr Nemec "Amorphous tellurite thin films prepared by sputtering", Proc. SPIE PC12887, Oxide-based Materials and Devices XV, PC128870P (16 March 2024); https://doi.org/10.1117/12.3002729
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KEYWORDS
Thin films
Sputter deposition
Chemical composition
Glasses
Sensors
Spectroscopy
Waveguides
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