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10 April 2024 Multicolor lithography, a promising approach to large-area nanopatterning
Sandra Gutierrez Razo, Nikolaos Liaros, Nicholas Fisher, Andrea Zeppuhar, Mona Abostate, John S. Petersen, Daniel E. Falvey, Amy S. Mullin, John T. Fourkas
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Proceedings Volume PC12956, Novel Patterning Technologies 2024; PC129560H (2024) https://doi.org/10.1117/12.3010932
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States
Abstract
Multicolor approaches to resolution enhancement in visible-light lithography hold the promise to afford resolution on the scale of tens of nm for large-area nanofabrication at a cost that is attractive for medium- to small-volume manufacturing applications, as well as in the research laboratory. In this talk I will review the history of multicolor lithography and discuss some of the latest advances in materials and methods.
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© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Sandra Gutierrez Razo, Nikolaos Liaros, Nicholas Fisher, Andrea Zeppuhar, Mona Abostate, John S. Petersen, Daniel E. Falvey, Amy S. Mullin, and John T. Fourkas "Multicolor lithography, a promising approach to large-area nanopatterning", Proc. SPIE PC12956, Novel Patterning Technologies 2024, PC129560H (10 April 2024); https://doi.org/10.1117/12.3010932
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KEYWORDS
Lithography
Nanostructures
Light sources
Materials properties
Near ultraviolet
Optical lithography
Photoresist materials
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