Journal of Micro/Nanolithography, MEMS, and MOEMS

Editor-in-Chief: Chris A. Mack, Lithoguru.com, USA

The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.

Journal of Micro/Nanolithography, MEMS, and MOEMS

Special Section on Control of Integrated Circuit Patterning Variance, Part 3: Pattern Roughness, Local Uniformity, and Stochastic Defects

Guest Editors: John Robinson, Tim Brunner, and Gian Lorusso

Design and characterization of a package-less hybrid PDMS-CMOS-FR4 contact-imaging system for microfluidic integration

Andres M. Galan, Gregory P. Nordin, and Shiuh-hua Wood Chiang

Demodulation phase angle compensation for quadrature error in decoupled dual-mass MEMS gyroscope

Jia Jia et al.

August 2018

TOP DOWNLOADS

from the Journal of Micro/Nanolithography, MEMS, and MOEMS


Fabrication of ultrahigh aspect ratio silicon nanostructures using self-assembled gold metal-assisted chemical etching

Joshua M. Duran, Andrew Sarangan (2017) Open Access


High-density electrical and optical probes for neural readout and light focusing in deep brain tissue

Vittorino Lanzio et al. (2018) Open Access


Stochastics in extreme ultraviolet lithography: investigating the role of microscopic resist properties for metal-oxide-based resists

Ruben Maas, M.-Claire van Lare, Gijsbert Rispens, Sander F. Wuister (2018) Open Access


Low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application

Mohammed Ashraf, Sree V. Sundararajan, Gianluca Grenci (2017) Open Access


Control of optical nanometer gap shapes made via standard lithography using atomic layer deposition

Jiyeah Rhie et al. (2018) Open Access


Shot noise: a 100-year history, with applications to lithography

Chris A. Mack (2018)


Surface feature engineering through nanosphere lithography

Tod V. Laurvick, Ronald A. Coutu, Jr., James M. Sattler, Robert A. Lake (2016) Open Access


Current understanding of the electrostatic risk to reticles used in microelectronics and similar manufacturing processes

Gavin C. Rider (2018) Open Access


Fabrication and analysis of metallic nanoslit structures: advancements in the nanomasking method

Stephen J. Bauman, Ahmad A. Darweesh, Desalegn T. Debu, Joseph B. Herzog (2018) Open Access


Effective–CD: a contribution toward the consideration of line edge roughness in the scatterometric critical dimension metrology

Bartosz Bilski, Karsten Frenner, Wolfgang Osten (2017) Open Access


Video introduction to the journal

Author benefits:

  • Rigorous and prompt peer review (median time from submission to first decision: 36 days)
  • Rapid, e-first publication of articles (median time from acceptance to online publication, including copyediting and typesetting: 24 days)
  • Professional copyediting and typesetting
  • Free online color figures
  • Free inclusion of videos and multimedia 
  • Open access publication option at a low cost
  • 5 free downloads from the SPIE Digital Library for authors
  • Integration with Code Ocean, a cloud-based code development and publishing platform

 

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