Journal of Micro/Nanolithography, MEMS, and MOEMS

Editor-in-Chief: Chris A. Mack, Lithoguru.com, USA

The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.

Journal of Micro/Nanolithography, MEMS, and MOEMS

Special Section on Extreme Ultraviolet Lithography for the 3-nm Node and Beyond

Guest editors:

Vivek Bakshi, Hakaru Mizoguchi, Ted Liang, Andrew Grenville, Jos Benschop

Elucidating the patterning mechanism of zirconium-based hybrid photoresists

Vasiliki Kosma, et al.

Black silicon integrated aperture

Tianbo Liu and David L. Dickensheets

November 2017

TOP DOWNLOADS

from the Journal of Micro/Nanolithography, MEMS, and MOEMS


Fabrication of ultrahigh aspect ratio silicon nanostructures using self-assembled gold metal-assisted chemical etching

Joshua M. Duran, Andrew Sarangan (2017) Open Access


Effective–CD: a contribution toward the consideration of line edge roughness in the scatterometric critical dimension metrology

Bartosz Bilski, Karsten Frenner, Wolfgang Osten (2017) Open Access


Black silicon integrated aperture

Tianbo Liu, David L. Dickensheets (2017)


Reliable before-fabrication forecasting of normal and touch mode MEMS capacitive pressure sensor: modeling and simulation

Sumit Kumar Jindal, Ankush Mahajan, Sanjeev Kumar Raghuwanshi (2017)


Site-specific metrology, inspection, and failure analysis of three-dimensional interconnects using focused ion beam technology

Frank Altmann, Richard J. Young (2014) Open Access


Influence of a wrinkle in terms of critical dimension variation caused by transmission nonuniformity and a particle defect on extreme ultraviolet pellicle

Guk-Jin Kim, In-Seon Kim, Sung-Gyu Lee, Michael Yeung, Min-Su Kim, Jin-Goo Park, Hye-Keun Oh (2017) Open Access


Multiwavelength Raman characterization of silicon stress near through-silicon vias and its inline monitoring applications

Woo Sik Yoo, Jae Hyun Kim, Seung Min Han (2014) Open Access


High-performance extended gate field-effect-transistor-based dissolved carbon dioxide sensing system with a packaged microreference electrode

Chia-Hsu Hsieh, Wei-Che Hung, Po-Han Chen, I-Yu Huang (2014) Open Access


Pattern inspection of etched multilayer extreme ultraviolet mask

Susumu Iida, Ryoichi Hirano, Tsuyoshi Amano, Hidehiro Watanabe (2016) Open Access


Surface feature engineering through nanosphere lithography

Tod V. Laurvick, Ronald A. Coutu, Jr., James M. Sattler, Robert A. Lake (2016) Open Access


Video introduction to the journal

Author benefits:

  • Rigorous and prompt peer review (median time from submission to first decision: 36 days)
  • Rapid, e-first publication of articles (median time from acceptance to online publication, including copyediting and typesetting: 24 days)
  • Professional copyediting and typesetting
  • Free online color figures
  • Free inclusion of videos and multimedia 
  • Open access publication option at a low cost
  • 5 free downloads from the SPIE Digital Library for authors
  • Integration with Code Ocean, a cloud-based code development and publishing platform

 

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