Journal of Micro/Nanopatterning, Materials, and Metrology
VOL. 23 · NO. 2 | April 2024
CONTENTS
Editorial
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 02, 020101, (June 2024) https://doi.org/10.1117/1.JMM.23.2.020101
Open Access
TOPICS: Photomasks, Lithography, Sustainability, Extreme ultraviolet, Energy efficiency, X-ray lithography, Wafer level optics, Solid state lasers, Simulations, Semiconductors
JM3 Letters
Anthony Yen, Weimin Gao
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 02, 020501, (May 2024) https://doi.org/10.1117/1.JMM.23.2.020501
TOPICS: Light sources and illumination, Printing, Refractive index, Semiconducting wafers, Wafer level optics, Tantalum, Photomasks, Image analysis, Boron nitride, Reflection
News and Commentary
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 02, 020701, (April 2024) https://doi.org/10.1117/1.JMM.23.2.020701
Open Access Video Abstract Content
TOPICS: Optical lithography, Printing
Special Section on Curvilinear Masks, Part 2
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 02, 021302, (March 2024) https://doi.org/10.1117/1.JMM.23.2.021302
TOPICS: SRAF, Lithography, Optical proximity correction, Printing, Photomasks, Manufacturing, Photovoltaics, Design, Extreme ultraviolet, Convolution
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 02, 021303, (May 2024) https://doi.org/10.1117/1.JMM.23.2.021303
TOPICS: Transformers, Visualization, Inspection, Design, Performance modeling, Image classification, Defect detection, Optical proximity correction, Education and training, Deep learning
Linyong (Leo) Pang, Dakota Seal, Tom Boettiger, Nagesh Shirali, Grace Dai, Aki Fujimura
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 02, 021304, (June 2024) https://doi.org/10.1117/1.JMM.23.2.021304
TOPICS: Critical dimension metrology, Metrology, Semiconducting wafers, Scanning electron microscopy, Optical proximity correction, Optical alignment, Lithography, SRAF, Photomasks, Contour extraction
Photoresists and other lithographic materials
Markus Greul, Astrit Shoshi, Jan Klikovits, Stephan Martens, Ulrich Hofmann, Olga Barahona, Benyamin Shnirman, Leon Starz, Patrick Wintrich, Holger Sailer
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 02, 024601, (May 2024) https://doi.org/10.1117/1.JMM.23.2.024601
Open Access
TOPICS: Photoresist materials, Photoresist developing, Critical dimension metrology, Photoresist processing, Electron beam lithography, Semiconducting wafers, Lithography, Standards development, Point spread functions, Monte Carlo methods
Peng Dong, Ying Lu, Tianhao Li, Yujie Song
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 02, 024602, (May 2024) https://doi.org/10.1117/1.JMM.23.2.024602
TOPICS: Silicon, Etching, Antireflective coatings, Photoresist materials, Lithography, Polymers, Film thickness, Vibration, Plasma, Fluorine
Back to Top