Nanoimprint lithography of deoxyribonucleic acid biopolymer films

Emily M. Fehrman-Cory; Roberto S. Aga Jr.; Jack P. Lombardi III; Carrie M. Bartsch; Andrew M. Sarangan; Emily M. Heckman

doi:10.1117/1.JMM.12.4.040501

16 December 2013 Nanoimprint lithography of deoxyribonucleic acid biopolymer films

Emily M. Fehrman-Cory, Roberto S. Aga Jr., Jack P. Lombardi III, Carrie M. Bartsch, Andrew M. Sarangan, Emily M. Heckman

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 12, Issue 4, 040501 (December 2013). https://doi.org/10.1117/1.JMM.12.4.040501

Abstract

Thermal nanoimprint lithography (NIL) is presented as an alternative fabrication technique for patterning deoxyribonucleic acid (DNA) biopolymer films for photonic device applications. The techniques and procedures developed for directly imprinting optical waveguide structures on a DNA biopolymer using NIL, bypassing the use of a resist layer and any chemical processing, are outlined here. The fabrication technique was developed with a Nanonex NX-2600 NIL flexible membrane system. Additionally, a process for using a Suss MicroTec ELAN CB6L substrate bonder is discussed as an alternative to commercially available NIL systems.

CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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Emily M. Fehrman-Cory, Roberto S. Aga Jr., Jack P. Lombardi III, Carrie M. Bartsch, Andrew M. Sarangan, and Emily M. Heckman "Nanoimprint lithography of deoxyribonucleic acid biopolymer films," Journal of Micro/Nanolithography, MEMS, and MOEMS 12(4), 040501 (16 December 2013). https://doi.org/10.1117/1.JMM.12.4.040501

Published: 16 December 2013

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KEYWORDS

Nanoimprint lithography

Biopolymers

Waveguides

Silicon

Polymers

Coating

Cladding

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