Special Section Guest Editorial: Alternative Lithographic Technologies

Douglas J. Resnick; Christopher Bencher; Ricardo Ruiz

doi:10.1117/1.JMM.13.3.031301

3 October 2014 Special Section Guest Editorial: Alternative Lithographic Technologies

Douglas J. Resnick, Christopher Bencher, Ricardo Ruiz

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 13, Issue 3, 031301 (October 2014). https://doi.org/10.1117/1.JMM.13.3.031301

Abstract

The SPIE Advanced Lithography Symposium is the most important and widely attended symposium on lithography today, typically attracting over 2000 attendees from more than 30 countries. For anyone working in the field and looking to understand the most current trends, the event constantly attracts the most groundbreaking work in the field and attracts the attention of the industry’s key decision makers.

© The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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Douglas J. Resnick, Christopher Bencher, and Ricardo Ruiz "Special Section Guest Editorial: Alternative Lithographic Technologies," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(3), 031301 (3 October 2014). https://doi.org/10.1117/1.JMM.13.3.031301

Published: 3 October 2014

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