Energy deposition in ultrathin extreme ultraviolet resist films: extreme ultraviolet photons and keV electrons

David F. Kyser; Nicholas K. Eib; Nicholas W.  M. Ritchie

doi:10.1117/1.JMM.15.3.033507

23 August 2016 Energy deposition in ultrathin extreme ultraviolet resist films: extreme ultraviolet photons and keV electrons

David F. Kyser, Nicholas K. Eib, Nicholas W. M. Ritchie

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 15, Issue 3, 033507 (August 2016). https://doi.org/10.1117/1.JMM.15.3.033507

Abstract

The absorbed energy density (eV/cm³) deposited by extreme ultraviolet (EUV) photons and electron beam (EB) high-keV electrons is proposed as a metric for characterizing the sensitivity of EUV resist films. Simulations of energy deposition are used to calculate the energy density as a function of the incident aerial flux (EUV: mJ/cm², EB: μC/cm²). Monte Carlo calculations for electron exposure are utilized, and a Lambert–Beer model for EUV absorption. The ratio of electron flux to photon flux which results in equivalent energy density is calculated for a typical organic chemically amplified resist film and a typical inorganic metal-oxide film. This ratio can be used to screen EUV resist materials with EB measurements and accelerate advances in EUV resist systems.

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David F. Kyser, Nicholas K. Eib, and Nicholas W. M. Ritchie "Energy deposition in ultrathin extreme ultraviolet resist films: extreme ultraviolet photons and keV electrons," Journal of Micro/Nanolithography, MEMS, and MOEMS 15(3), 033507 (23 August 2016). https://doi.org/10.1117/1.JMM.15.3.033507

Published: 23 August 2016

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