Development of extreme ultraviolet scatterometer using multiple orders of high-harmonic generation

Yi-Sha Ku; Wei-Ting Wang; Yi-Chang Chen; Ming-Chang Chen; Chia-Liang Yeh; Chun-Wei Lo

doi:10.1117/1.JMM.17.1.014001

24 February 2018 Development of extreme ultraviolet scatterometer using multiple orders of high-harmonic generation

Yi-Sha Ku, Wei-Ting Wang, Yi-Chang Chen, Ming-Chang Chen, Chia-Liang Yeh, Chun-Wei Lo

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 17, Issue 1, 014001 (February 2018). https://doi.org/10.1117/1.JMM.17.1.014001

Abstract

We developed an extreme ultraviolet (EUV) scatterometer equipped with a table-top EUV source for the characterization of nanoscale grating lines. Appropriate orders of high-harmonic generation at wavelengths ranging from 25 to 35 nm are selected as the coherent light source for high-resolution spatial performance. It is shown that the grating surface profile significantly affects the scattered diffraction intensities and can be retrieved by the structure reconstruction algorithms using inverse modeling by rigorous coupled wave analysis.

CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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Yi-Sha Ku, Wei-Ting Wang, Yi-Chang Chen, Ming-Chang Chen, Chia-Liang Yeh, and Chun-Wei Lo "Development of extreme ultraviolet scatterometer using multiple orders of high-harmonic generation," Journal of Micro/Nanolithography, MEMS, and MOEMS 17(1), 014001 (24 February 2018). https://doi.org/10.1117/1.JMM.17.1.014001

Received: 1 September 2017; Accepted: 5 February 2018; Published: 24 February 2018

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KEYWORDS

Diffraction

Diffraction gratings

Extreme ultraviolet

Sensors

Charge-coupled devices

CCD cameras

CCD image sensors

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