Holographic mask aligner

Francis S. M. Clube; Simon Gray; Denis Struchen; Jean-Claude Tisserand

doi:10.1117/12.145967

1 October 1993 Holographic mask aligner

Francis S. M. Clube, Simon Gray, Denis Struchen, Jean-Claude Tisserand

Author Affiliations +

Optical Engineering, Vol. 32, Issue 10, (October 1993). https://doi.org/10.1117/12.145967

Abstract

Total internal reflection holography permits high-resolution, noncontact lithography over very large fields. A production lithographic system has been constructed employing specially developed illumination, focus, and alignment subsystems integrated onto a 6-in. substrate-handling mechanism. The system achieves an imaging resolution of 0.25 μm with a present overlay capability of ± 0.5 μm. A fine alignment system under development has demonstrated a 50-nm measurement accuracy. The technology is well suited to many applications, including the manufacture of flat panel displays, surlace acoustic wave devices, integrated optics, and optical storage disks.

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Francis S. M. Clube, Simon Gray, Denis Struchen, and Jean-Claude Tisserand "Holographic mask aligner," Optical Engineering 32(10), (1 October 1993). https://doi.org/10.1117/12.145967

Published: 1 October 1993

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