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Akifumi Ueda
at Mitsubishi Rayon Co Ltd
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Publications (1)
Proceedings Article | 23 March 2007 Paper
Chemical composition distribution analysis of photoresist copolymers and influence on ArF lithographic performance
Hikaru Momose, Atsushi Yasuda, Akifumi Ueda, Takayuki Iseki, Koichi Ute, Takashi Nishimura, Ryo Nakagawa, Tatsuki Kitayama
Proceedings Volume 6519, 65192F (2007) https://doi.org/10.1117/12.711760
KEYWORDS: Polymers, Photoresist materials, Polymerization, Lithography, Chemical analysis, Chromatography, Adsorption, Photoresist developing, Performance modeling, Magnetism
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